COPRA Ring Plasma Sources

The COPRA RF-ICP Plasma Beam Technology based on its inductively coupled 13,56 MHz excitation. Scalable from R&D to more or less any kind of industrial production scale the COPRA´s unrivaled characteristics allows one to work with constant basic plasma parameters. This means that your process result is not negatively affected by scaling in this and speed as long as the right power level is adjusted. The COPRA RF-ICP sources are working gas independent, reliable and maintenance poor. This makes them perfectly suited to full-fill your process and application needs. The Standard COPRA delivers a high ion current (ICD) at constantly low ion energies (IE) which can be easily controlled and adjusted if needed. The always integrated RF-Matching-Network as well as the possibility of customization and freedom of scalability completes our portfolio.