The COPRA RF-ICP Plasma Beam Technology based on its inductively coupled 13,56 MHz excitation. Scalable from R&D to more or less any kind of industrial production scale the COPRA´s unrivaled characteristics allows one to work with constant basic plasma parameters. This means that your process result is not negatively affected by scaling in this and speed as long as the right power level is adjusted. The COPRA RF-ICP sources are working gas independent, reliable and maintenance poor. This makes them perfectly suited to full-fill your process and application needs. The Standard COPRA delivers a high ion current (ICD) at constantly low ion energies (IE) which can be easily controlled and adjusted if needed. The always integrated RF-Matching-Network as well as the possibility of customization and freedom of scalability completes our portfolio.
The COPRA Linear Plasma Sources (LS-Series) are Plasma PVD-Assist as well as direct PECVD Plasma Sources for box, R2R & inline coater setup´s. Different configuration types enable adequate choice of gas types, appropriate PVD-Assist functions and-/or direct PECVD depostion as well as chemcial etching. Due to their excellent homogenous distribution of the Ion current densities these sources are Large Area capable. The COPRA Linear Plasma Sources can work with nearly all types of gases and reach dissociation degrees of up to 90% with plasma densities >1x10-12 cm3. The COPRA Linear Plasma Sources are easily scalable to serve customized dimensional needs.
The COPRA Linear Plasma Sources are suitable for…
CCR GmbH
Camp-Spich-Str. 3a
D-53842 Troisdorf
T: +49(0)2241-93215-0
F: +49(0)2241-93215-200
